Plasma CVD Equipment - Company Ranking(10 companies in total)
Last Updated： Aggregation Period:Nov 05, 2025〜Dec 02, 2025
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Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| 【Specifications】 ■ ICP-CVD deposition equipment and ICP-RIE dry etcher ■ Temperature range: -20℃ to 150℃ (modifiable with options) ■ Support... | 【Purpose】 ■Development of various products requiring dry etching and film formation. | ||
| 【Specifications】 ■Size: (Main unit, standard) W~800mm x D1700mm x H1500mm *Size varies depending on configuration ■Gas piping: Up to 12 lin... | 【Usage】 ■ For film formation, etching, cleaning, and patterning in semiconductor manufacturing processes ■ For the removal of polymer layers... | ||
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プラズマ・サーモ・ジャパン
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- Featured Products
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Plasma CVD device "210D model"
- overview
- 【Specifications】 ■ ICP-CVD deposition equipment and ICP-RIE dry etcher ■ Temperature range: -20℃ to 150℃ (modifiable with options) ■ Support...
- Application/Performance example
- 【Purpose】 ■Development of various products requiring dry etching and film formation.
Plasma CVD equipment "SHUTTLELINE(R) Series"
- overview
- 【Specifications】 ■Size: (Main unit, standard) W~800mm x D1700mm x H1500mm *Size varies depending on configuration ■Gas piping: Up to 12 lin...
- Application/Performance example
- 【Usage】 ■ For film formation, etching, cleaning, and patterning in semiconductor manufacturing processes ■ For the removal of polymer layers...
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プラズマ・サーモ・ジャパン
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