Plasma CVD Equipment - Company Ranking(10 companies in total)

Last Updated：Oct 22, 2025 Aggregation Period:Sep 24, 2025〜Oct 21, 2025
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Company Name	Company information	Featured Products
Company Name	Company information	Product Image, Product Name, Price Range	overview	Application/Performance example
サムコ	Address Kyoto/ number of employees 170 Business Activities We manufacture and sell semiconductor and other electronic components. We produce and sell cutting-edge plasma CVD equipment for thin film f... Key Partners Major electronic components manufacturer Universities, government agencies, research ins...	Plasma CVD equipment for thick film formation of SiO2 Other	The PD-270STP is a low-temperature, high-speed plasma CVD device for forming silicon oxide films (SiO2) using liquid source TEOS. The high s...	● Manufacturing of optical components such as optical waveguides ● Mask formation for micromachines ● Formation of protective films for pl...
		[Data] Silicon processing data using the non-bosch process Other	For more details, please refer to the PDF document or feel free to contact us.	For more details, please refer to the PDF document or feel free to contact us.
		Plasma CVD equipment Other	The PD-220LC is a production-type plasma CVD system designed to form various silicon-based thin films (such as Si3N4 and SiO2). It employs a...	● Formation of silicon nitride film as a passivation layer ● Formation of silicon oxide film as an interlayer dielectric ● Formation of an...
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